Reddy PRS. Structural and electrical characteristics of Zr-doped HfO2 (HZO) thin films deposited by atomic layer deposition for RRAM applications. Mater. Tech. Rep. [Internet]. 2024Jan.8 [cited 2024Nov.21];2(1):461. Available from: https://ojs.acad-pub.com/index.php/MTR/article/view/461