Reddy, P. R. Sekhar. “Structural and Electrical Characteristics of Zr-Doped HfO2 (HZO) Thin Films Deposited by Atomic Layer Deposition for RRAM Applications”. Materials Technology Reports 2, no. 1 (January 8, 2024): 461. Accessed November 21, 2024. https://ojs.acad-pub.com/index.php/MTR/article/view/461.