Sekhar Reddy, P. R. “Structural and Electrical Characteristics of Zr-Doped HfO₂ (HZO) Thin Films Deposited by Atomic Layer Deposition for RRAM Applications”. Materials Technology Reports, Vol. 2, no. 1, Jan. 2024, p. 461, doi:10.59400/mtr.v2i1.461.